{"id":5241,"date":"2022-10-22T03:11:40","date_gmt":"2022-10-22T00:11:40","guid":{"rendered":"https:\/\/micl.co.il\/product\/plasma-etch"},"modified":"2022-10-22T22:11:15","modified_gmt":"2022-10-22T19:11:15","slug":"plasma-etch","status":"publish","type":"product","link":"https:\/\/www.micl.co.il\/product\/plasma-etch","title":{"rendered":"Plasma Etch Nisene"},"content":{"rendered":"<p><span style=\"color: #2d2e82;\"><strong><span style=\"font-size: 22px;\">It Works. Here\u2019s How<\/span><\/strong><\/span><\/p>\n<p>The PlasmaEtch decapsulation system is a revolutionary patented gas-based semiconductor etching system (US patent number 9,548,227).<br \/>\nEmploying a never-before-seen application of microwaved gases inciting chemical radicals for isotropic etching, the PlasmaEtch is the greenest and most cost-effective etching solution available.<br \/>\nUsing microwave-induced plasma \u2014 or MIP \u2014 etching, the PlasmaEtch can decapsulate most sample sizes, encapsulant types, and wire bond types.<\/p>\n<p>Whether it\u2019s a more traditional gold wire sample, or if the sample features copper or silver wires, the PlasmaEtch delivers a safe and reliable etch.<\/p>\n<p><span style=\"color: #2d2e82;\"><strong><span style=\"font-size: 22px;\">Plasma Etch Innovations:<\/span><\/strong><\/span><\/p>\n<ul>\n<li>Afterburner Downstream Focused Plasma Etching<\/li>\n<li>Mass Flow Controlling for All Gases<\/li>\n<li>No Microwave Radiation Exposure to Samples During Etch Process<\/li>\n<li>Low-Temperature Etching<\/li>\n<li>Isotropic Etching<\/li>\n<\/ul>\n<p>Unlike typical and less sophisticated plasma decap systems that take many hours or even days to get to the surface of the die, the PlasmaEtch can clear the encapsulant of most package types and reveal the complete die surface and wire sweep in a matter of a couple of hours. Chemical-free decapsulation has never been so effective.<\/p>\n<p>Other MIP systems out there rely heavily on the usage of ultrasonication as part of their process. The PlasmaEtch\u2019s MIP etching is such that it uses carefully programmed recipes with high-accuracy mass flow controllers (MFC) in conjunction with a process chamber at vacuum to remove encapsulant in a fast and effective way &#8211; <strong>without the need for ultrasonic<\/strong> or any additional processes!<\/p>\n<p><span style=\"color: #2d2e82;\"><span style=\"font-size: 22px;\"><strong>Highlights Include:<\/strong><\/span><\/span><\/p>\n<ul>\n<li>Highly Customizable Etch Recipes<\/li>\n<li>Etches a Wide Variety of Package Types<\/li>\n<li>Completely Chemical-free Decap<\/li>\n<li>Eco-friendly<\/li>\n<li>Touchscreen Interface<\/li>\n<li>PC\/Windows-based GUI<\/li>\n<li>The Only Solution for Silver Wires<\/li>\n<li>Etches Samples with All Wire Types<\/li>\n<li>Small Footprint Suited for Tabletop<\/li>\n<\/ul>\n<p style=\"text-align: center;\"><span style=\"color: #2d2e82;\"><strong><span style=\"font-size: 24px;\">Please contact us for further details<\/span><\/strong><\/span><\/p>\n","protected":false},"excerpt":{"rendered":"<p><span style=\"color: #2d2e82;\"><span style=\"font-size: 22px;\"><strong>Plasma IC Decapsulation. It\u2019s Here<\/strong><\/span><\/span><\/p>\n<p>MIP Etching<br \/>\nAs the world moves toward more eco-friendly processes and the semiconductor manufacturing industry continues to make smaller parts with sensitive internal components, failure analysts are presented with a unique challenge: how do you etch these samples? Nisene Technology Group has bridged the gap between semiconductor manufacturing technology and failure analysis with its latest decapsulation system: the PlasmaEtch.<\/p>\n","protected":false},"featured_media":7493,"comment_status":"closed","ping_status":"closed","template":"","meta":[],"product_cat":[348],"product_tag":[],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v22.0 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Plasma Etch Nisene - MICL Group<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.micl.co.il\/product\/plasma-etch\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Plasma Etch Nisene - MICL Group\" \/>\n<meta property=\"og:description\" content=\"Plasma IC Decapsulation. It\u2019s Here  MIP Etching As the world moves toward more eco-friendly processes and the semiconductor manufacturing industry continues to make smaller parts with sensitive internal components, failure analysts are presented with a unique challenge: how do you etch these samples? 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It\u2019s Here  MIP Etching As the world moves toward more eco-friendly processes and the semiconductor manufacturing industry continues to make smaller parts with sensitive internal components, failure analysts are presented with a unique challenge: how do you etch these samples? 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