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WAFER-VAC System 220 VAC – Without hose, tips, or vacuum handle.

Wafering Blade, CBN Metal Bond, 4″ X .012″ X ½” (102 x 0.31mm)

Wafering Blade, CBN Metal Bond, 5″ X .015″ X ½” (127 x 0.38 mm)

Wafering Blade, CBN Metal Bond, 6″ x .020″ x ½” (152 x 0.51mm)

Wafering Blade, CBN Metal Bond, 7″ x .025″ x ½” (178 x 0.64mm)

Wafering Blade, CBN Metal Bond, 8″ X .030″ X ½” (203 x 0.76mm)

Wafering Blade, CBN Resin Bonded, 5″ X .020″ X ½”

Wafering Blade, CBN Resin Bonded, 6″ X .020″ X ½”

Wafering Blade, CBN Resin Bonded, 7″ X .025″ X ½”

Wafering Blade, CBN Resin Bonded, 8 X .030″ X ½”

Wafering Blade, Diamond Metal Bond, High Concentration, 3″ x 0.006″ x ½” (76 x 0.15 mm)

Wafering Blade, Diamond Metal Bond, High Concentration, 4″ x 0.012″ x ½” (102 x 0.31 mm)

Wafering Blade, Diamond Metal Bond, High Concentration, 4″ x 0.012″ x ½” (102 x 0.31 mm)

Wafering Blade, Diamond Metal Bond, High Concentration, 5″ x 0.015″ X ½” (127 x 0.38 mm)

Wafering Blade, Diamond Metal Bond, High Concentration, 5″ x 0.015″ X ½” (127 x 0.38 mm)

Wafering Blade, Diamond Metal Bond, High Concentration, 6″ x 0.020″ x ½” (152 x 0.51mm)

Wafering Blade, Diamond Metal Bond, High Concentration, 7″ x 0.25″ x ½” (178 x 0.64mm)

Wafering Blade, Diamond Metal Bond, High Concentration, 8″ x 0.030″ x ½” (203 x 0.76mm)

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MICL supports the Semiconductor, Military, and Microelectronics industries, as well as a wide range of R&D industries. In addition, MICL supports ALL local Academic and Nano Development centers.

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